A new low-temperature high-aspect-ratio MEMS process using plasma activated wafer bonding

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A new low-temperature high-aspect-ratio MEMS process using plasma activated wafer bonding

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ژورنال

عنوان ژورنال: Journal of Micromechanics and Microengineering

سال: 2011

ISSN: 0960-1317,1361-6439

DOI: 10.1088/0960-1317/21/4/045020